Clean Skin – Máscara Ultra Suavizante
Composição:
Aqua (Water), Cetearyl Alcohol, Ceteareth-20, BHT, Ethylhexyl Stearate, Disodium EDTA, Vitis Vinifera Seed Oil, Propylene Glycol, Allantoin, Kaolin, Titanium Dioxide, Zinc Oxide, Sodium Carboxymethyl Beta-glucan, Menthyl Lactate, Phenoxyethanol, Methylisothiazolinone, Malpighia Glabra Fruit Extract, Melissa Officinalis Leaf Extract, Mentha Piperita Extract, Rosmarinus Officinalis Extract, Lactic Acid, Parfum (Fragrance).
Processo nº 25351.575759/2014-20
